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author | Matt Reimer <mreimer@sdgsystems.com> | 2015-02-23 14:52:22 -0700 |
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committer | Pantelis Antoniou <pantelis.antoniou@konsulko.com> | 2015-03-18 09:51:56 +0200 |
commit | 8ebde4f0b3e513a41b388893a66ade4a6c292465 (patch) | |
tree | e1419aa294156d7d5ff99efe365b38e09b9017f2 /include/spartan2.h | |
parent | 323aaaa1e364bf8426a9c8fd5158fe2d155ae7b9 (diff) | |
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mmc: s5p: properly mask SELBASECLK
Properly mask SELBASECLK by using an actual mask rather than the
number of bits to shift in order to create the mask.
Signed-off-by: Matt Reimer <mreimer@sdgsystems.com>
Acked-by: Jaehoon Chung <jh80.chung@samsung.com>
Diffstat (limited to 'include/spartan2.h')
0 files changed, 0 insertions, 0 deletions